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Système d’Information, conception RobustE des Produits
Laboratoire des Sciences pour la Conception, l'Optimisation et la Production de Grenoble
Système d’Information, conception RobustE des Produits

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IMPROVE/ INTEGRATE/IMPLEMENT Projects

G-SCOP and STMicroelectronics partnership:  Review on 10 years collaboration

The collaboration between G-SCOP laboratory and STMicroelectronics started with Mr. Hendrik Busch (2003-2006) CIFRE PhD. "Towards the re-use of knowledge in dynamic industrialization processes: Case study in the microelectronic domain" under the supervision of Prof. Michel Tollenaere. Since then, it has led a strong collaboration between G-SCOP and STMicroelectronics in the shape of CIFRE PhDs and partnership in European project IMPROVE. The PhD of Dr. Aymen Mili "Towards more reliable process control methods by means of risk management : contribution in an integrated design and manufacturing microelectronics plant" at STMicroelectronics in 2006-2009 provided a strong platform for the G-SCOP laboratory to integrate with STM on its core manufacturing processes to reduce process variability with qualitative methods e.g. 8D, AMDEC, FMEA etc. It is because of the excellent results from Mili's PhD which supported the inclusion of G-SCOP lab in the European project IMPROVE in 2009.

The IMPROVE (Implementing Manufacturing science solutions to increase equiPment pROductiVity and fab pErformance) is a joint project with 36 partners across Europe which started in 2009. It is EU funded project (3.5 years) with emphasis on enhancing EU semiconductor fabs efficiency by providing methods and tools to (i) better control the process variability, (ii) reduce cycle time and (iii) enhance effectiveness of the production equipment. Based on the Mr. Mili's PhD, the G-SCOP laboratory initiated and proposed 2 Industrial PhDs and a 3 years postdoc position in this project. The general context and scope of the collaboration with STMicroelectronics is presented below in figure 1. Mr. Bouaziz M.F. (2009-2012) continued the work of Mr. Mili and quantified the risk on the cycle time, product quality and production resulting from the process variability with probabilistic graphical models (PGM). He holds competence in Bayesian and Petri net modeling of complex systems with high level of uncertainty to improve prediction of potential critical events. In the IMPROVE project, Mr. Bouaziz has presented the concept of EHF (equipment health factor) to improve the proactive/predictive maintenance to reduce process variability and improve the equipment availability. Mr. Bettayeb B. (2009-2012) in his PhD worked on the design and improvement of target control plans to minimize the quantified risk (EHF) while optimizing available inspection/ metrology tools capacities. Mr. Sahnoun M. also worked on the same subject during postdoc (2009-2012) and in collaboration with Mr. Bettayeb B. has proposed models using operations research and genetic techniques. The significance and strength of contributions made during the IMPROVE project is evident from scientific publications in international conferences and well reputed journals. The success of these contributions made from the G-SCOP laboratory is a result of diligent supervision from Profs. Michel Tollenaere, Eric Zamai, Samuel Bassetto and Ali Siadat from LGIPM Arts et Metiers Paristech Metz.

Besides the IMPROVE project, G-SCOP laboratory is identifying and proposing key improvement areas within design and manufacturing processes of the semiconductor industry (SI). The Industrial PhD of Mr. Shahzad M.K. (2008-2011) is an example of this collaboration. It is focused on efficient data exploitation from the existing production databases. These production data sources at present are optimized to improve the cycle times and product quality, however they have little support for R&D efforts due to missing links between databases, ontology issues and missing data dimensions. The proposed models within this PhD removes these issues and ensures the utilization of huge manufacturing data collected across the production line to be efficiently and effectively used during R&D efforts. It enables the link from manufacturing to design quick technology alignment and adoption. A new industrial PhD has been proposed (Mr. Anis 2012-2015) that effectively uses the results of Mr. Mili, Mr. Bouaziz and Mr. Shahzad's PhD to dynamically improve the maintenance plans based on the quantified risk (EHF) and efficient manufacturing data exploitation.

 

Figure 1. G-SCOP and STMicroelectronics Partnership and Collaboration

The collaboration between G-SCOP Laboratory and STMicroelectronics is the result of joint effort and initiatives from Profs. Michel Tollenaere, Daniel Brissaud, Nadia Brauner Vettier, Eric Zamai, Samuel Bassetto on one hand and Mr. Stephan Hubac and Mr. Philippe Vialletelle from STMicroelectronics on the other hand. The G-SCOP laboratory has successfully established its competence in semiconductor manufacturing processes and improvement link from manufacturing to design (Prof. Michel Tollenaere, Eric Zamai and Samuel Bassetto) besides the competence in electronic chip design (Prof. Nadia Brauner Vettier) and environmental friendly design (Prof. Daniel Brissaud). As a result the IMPROVE project was listed in 10 best European project http://industrialtechnologies2012.eu/best-project-award. The G-SCOP laboratory has also been invited in the INTEGRATE project (expected to start from January, 2013) and we are committed to support the partners in the project specially STMicroelectronics to benefit from academic research in achieving their business objectives and leadership position.

List of Scientific Contributions (manufacturing perspectives)

International Journals

  • Ben Said A., Shahzad M.K., Zamai E., Hubac S. and Tollenaere M., 2015, "Experts' knowledge renewal and maintenance optimization in high-mix low-volume industries, using Bayesian approach", Cognition, Technology & Work, Springer, CTWO-S-15-00069 [IF 1] To be published.
  • Nduyen D-T., Duong, Q-B., Zamai E., Shahzad M-K., (2015), Fault diagnosis for the complex manufacturing system, Journal of Risk and Reliability (JRR-15-0029) [IF 0.775].
  • Abu-Samah A., Shahzad M.K., Zamai E., Hubac S., (2014), Effective Maintenance by Reducing Failure-Cause Misdiagnosis in Semiconductor Industry (SI), International Journal of Prognostics and Health Management: Vol 6 (1) 009, pages: 18, ISSN2153-2648, 2015 009 [IF 0.58].
  • Sahnoun M., Bettayeb B., Bassetto S., Tollenaere M., (2014),  "Simulation-based optimization of sampling plans to reduce inspections while mastering the risk exposure in semiconductor manufacturing", Journal of Intelligent Manufacturing, Springer Verlag (Germany), 2014
  • Bouaziz M-F., Zamaï E., Duvivier F. , «Towards Bayesian Network Methodology for Predicting the equipment Health Factor of Complex Semiconductor Systems », International Journal of Production Research, Taylor & Francis: 2013, Volume 51 (Issue 15,), pp.4597-4617. <10.1080/00207543.2013.775525>.
  • Bettayeb B., Bassetto S., Vialletelle Ph., Tollenaere M., "Quality and exposure control in semiconductor manufacturing. Part II:Evaluation", International Journal of Production Research, Taylor & Francis: STM, 2012, 50 (23), pp.6852 - 6869.
  • Bettayeb B., Bassetto S., Vialletelle Ph., Tollenaere M., "Quality and exposure control in semiconductor manufacturing. Part I: Modelling", International Journal of Production Research, Taylor & Francis: 2012, 50 (23), pp.6835-6851. <10.1080/00207543.2011.630042>
  • Bassetto S., Siadat A., Tollenaere M., "The management of process control deployment using interactions in risks analyses", Journal of Loss Prevention in the Process Industries, Elsevier, 2011, 24 (4), pp.458 - 465
  • Shanoun M., Bassetto S., Bastoini S., Vialletelle Ph. (2011), "Optimisation of the process control in a semiconductor company: model and case study of defectivity sampling", International Journal of Production Research, 49:13, 3873-3890; DOI: 10.1080/00207543.2010.484429.


International Conferences

M-F. Bouaziz, E. Zamaï, « Equipment Health Factor prediction for complex semiconductor manufacturing facility », Proceedings of 4th IFAC Symposium on Information Control Problems in Manufacturing (IFAC INCOM 2012), paper N°377, Bucharest, Romania, May 23-25 2012. [Accepted].

M-F. Bouaziz, E. Zamaï, S, Hubac, « Modélisation de l'état de santé d'un équipement de fabrication par une approche Bayésienne », 9th International Conference on Modeling, Optimization & SIMulation (MOSIM 2012), paper N°144, pp xx - xx, Bordeaux, France, June 06-08 2012. [Submitted].

M-F. Bouaziz, M. Sahnoun, E. Zamaï, S. Hubac, Decision making based on the EHF integration in a complex semiconductor manufacturing, 12th European Advanced Process Control and Manufacturing Conference, APCM 2012 MINATEC Grenoble, France - April 16-18, 2012

M.K. Shahzad, S. Hubac, A. Siadat, M. Tollenaere, "An Interdisciplinary FMEA methodology to find true DFM challenges", 12th European Advanced Process Control and Manufacturing Conference, APCM 2012 MINATEC Grenoble, France - April 16-18, 2012

M.K. Shahzad, S. Hubac, A. Siadat, M. Tollenaere, "MAM (mapping and alignment model) for inspection data in semiconductor industry", 12th European Advanced Process Control and Manufacturing Conference, APCM 2012 MINATEC Grenoble, France - April 16-18, 2012

M.K. Shahzad, S. Hubac, A. Siadat, M. Tollenaere, " ROMMII (referential ontology meta model for information integration) Architecture for Dynamic Restructuring of DWH data models", 12th European Advanced Process Control and Manufacturing Conference, APCM 2012 MINATEC Grenoble, France - April 16-18, 2012

M.K. Shahzad, S. Hubac, A. Siadat, M. Tollenaere, " SPM (spatial positioning model) model to improve DFM methods", 12th European Advanced Process Control and Manufacturing Conference, APCM 2012 MINATEC Grenoble, France - April 16-18, 2012

M. Sahnoun, B. Bettayeb, M. Tollenaere, S. Bassetto, Smart Sampling for Risk reduction and Delay Optimisation IEEE International Systems Conference, SYSCON 2012, Vancouver, Canada, March 19-22, 2012.

M. Sahnoun, B. Bettayeb, P. Vialletelle, A. Mili, M. Tollenaere Impact of Sampling on W@R and Metrology Time delay Intel European Research & Innovation Conference 2011, ERIC 2011. Dublin, Ireland, 12-14 October 2011.

M.K. Shahzad, S. Hubac, A. Siadat, M. Tollenaere, "An Extended Business Model to Ensure Time-to-Quality in Semiconductor Manufacturing Industry", International Conference on Enterprise Information Systems, 2011, Portugal

M.K. Shahzad, M. Tollenaere, S. Hubac, A. Siadat, "Extension des Methodes DFM pour l'industrialisation de produits microelectroniques", 9e Congrès International de Génie Industriel Montréal, 2011, Canada

M-F. Bouaziz, E. Zamaï, S. Monot, F. Duvivier, S. Hubac, « Towards a Bayesian Network methodology to improve maintenance of complex semiconductor systems », Proceedings of European Safety & Reliability Conference (ESREL 2011), Bérenguer, Grall & Guedes Soares (eds) © 2012 Taylor & Francis Group, London, UK. ISBN 978-0-203-13510-5, pp 116 - 123, Troyes, France, September 18-22 2011.

M-F. Bouaziz, E. Zamaï, F. Duvivier, S. Hubac, « Dependability of complex semiconductor systems Learning Bayesian Networks for decision support », Proceedings of Third International Workshop on Dependable Control of Discrete Systems (IEEE DCDS 2011), paper N°41, pp 09 - 14, Saarbrüken, Germany, June 15-17 2011.

M. Sahnoun, Ph. Vialletelle, S. Bassetto, S. Bastoini, M. Tollenaere, Computation of Wafer-At-Risk from Theory to Real Life Demonstration 13th ARCSIS Meeting, Rousset, France, November, 18-19, 2010.

M. Sahnoun, Ph. Vialletelle, S. Bassetto, S. Bastoini, M. Tollenaere Optimizing Return On Inspection Trough Defectivity Smart  Sampling the 17th IEEE International Symposium on Semiconductor Manufacturing, ISSM2010, Tokyo, Japan, October 18-20, 2010

B. Bettayeb,  Ph. Vialletelle,  S. Bassetto et M. Tollenaere. "Optimized design of control plans based on risk exposure and resources capabilities". IEEE International Symposium on Semiconductor Manufacturing ISSM2010, Tokyo, Japan, October 18-20, 2010

National Conferences

M-F. Bouaziz, E. Zamaï, « Analyse des risques des systèmes complexes : vers une approche Bayésienne », 4èmes Journées Doctorales / Journées Nationales MACS (JD-JN-MACS'11), papier N°85, pp 280 - 286, 6p, Marseille, France, 09-10 juin 2011.

M-F. Bouaziz, E. Zamaï, « Réseaux Bayésiens pour la classification des causes de défaillances : Application aux systèmes à événements discrets complexes », 6èmes Journées Francophones sur les réseaux bayésiens, îles Kerkennah, Tunisie, 11-13 Mai, 2012. [Accepted].

Others

M-F. Bouaziz, E. Zamaï, S. Monot, F. Duvivier, S. Hubac, « Sûreté de fonctionnement des équipements de fabrication dans les ateliers semi-conducteurs », 4ème Workshop du Groupement d'Intérêt Scientifique «Surveillance, Sûreté et Sécurité des Grands Systèmes » (3SGS'11), poster N°25, Valenciennes, France, 12-13 Octobre, 2011.

M-F. Bouaziz, Q-B. Duong, E. Zamaï, S. Hubac, F. Duvivier, « Equipment Health Factor calculation for equipment diagnosis and maintenance optimization in complex semiconductor workshops », Workshop: Applications industrielles « Sûreté, Surveillance, Supervision » (GTS3-GDRMACS/SEE/SAFFE-GIS3SGS), poster N°29, Paris, France, 18 Janvier, 2012.

 

Project Delivrables

E. Zamaï, M. Sahnoun, M. Bouaziz, F. Duvivier, Ph. Vialletelle, Specifications for automatic feeding of process control applications, (IMPROVE-WP4-D4-1-1), 15/02/2010

B. Bettayeb, S. Bassetto, Ph. Vialletelle, Proof-of-concept "Target Control Plan"v1 (static risk FMEA + one meas. type) (IMPROVE-WP4-D4-2-2), 15/02/2010

B. Bettayeb, Ph. Vialletelle, J. N'Duhura, Evaluation report / POC Automatic computation of control plan with W/I limit, (IMPROVE-WP4-D4.2.4) 10/05/2011.

S. Hubac, M-F. Bouaziz, E. Zamaï, « Report on improvements of equipment effectiveness, failure rate and recovering », IMPROVE ENIAC European project Deliverable (IMPROVE-WP3-D3.5.1-Internal version), 24p, Feb 2012.

S. Hubac, M-F. Bouaziz, E. Zamaï, S. Monot, F. Duvivier, « Predictive Equipment Behaviour: Tool Health Indicator Description & Validation », IMPROVE ENIAC European project Deliverable (IMPROVE-WP3-D3.4.1), 52p, Jun 2011.

Rédigé par Michel Tollenaere

mise à jour le 31 mars 2016

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